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VGU RESEARCH REPOSITORY


Please use this identifier to cite or link to this item: https://epub.vgu.edu.vn/handle/dlibvgu/2180
DC FieldValueLanguage
dc.contributor.authorCong Vu Tran Thanhen_US
dc.date.accessioned2026-03-19T08:49:53Z-
dc.date.available2026-03-19T08:49:53Z-
dc.date.issued2024-
dc.identifier.urihttps://epub.vgu.edu.vn/handle/dlibvgu/2180-
dc.description.abstractThe optimal structure, characterized by minimal material usage and compliance, is determined through an iterative process known as topology optimization. In recent years, this method has seen significant advancements in the field of additive manufacturing, where complex structures can now be fabricated with greater ease compared to earlier methods. Within the scope of this research, emphasis is placed on the general formulation of the optimization problem using negative masks for minimum compliance, enabling its application to various mask shapes. In this framework, modifying the mask structure requires only adjustments to the material model and its gradient with respect to the design parameters. Subsequently, the performance of circular masks and smoothed equilateral triangular negative masks is evaluated, with their advantages and limitations compared to each otheren_US
dc.language.isoenen_US
dc.rightsAttribution-NonCommercial 4.0 International*
dc.rights.urihttps://creativecommons.org/licenses/by-nc/4.0/*
dc.subjectTopology optimizationen_US
dc.subjectNagative masksen_US
dc.titleAn investigation of smoothed equilateral triangular negative masks for 2D linear topology optimizationen_US
dc.typeThesisen_US
item.fulltextWith Fulltext-
item.grantfulltextrestricted-
item.languageiso639-1other-
Appears in Collections:Computational Engineering (CompEng)
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