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VGU RESEARCH REPOSITORY


Please use this identifier to cite or link to this item: https://epub.vgu.edu.vn/handle/dlibvgu/101
DC FieldValueLanguage
dc.contributor.authorHai Le-Theen_US
dc.contributor.authorJasper J. A. Lozemanen_US
dc.contributor.authorMarta Lafuenteen_US
dc.contributor.authorPablo Muñozen_US
dc.contributor.authorJohan G. Bomeren_US
dc.contributor.authorTong Duy Hienen_US
dc.contributor.authorErwin Berenschoten_US
dc.contributor.authorAlbert van den Bergen_US
dc.contributor.authorNiels R. Tasen_US
dc.contributor.authorMathieu Odijken_US
dc.contributor.authorJan C. T. Eijkelen_US
dc.date.accessioned2020-03-12T16:55:07Z-
dc.date.available2020-03-12T16:55:07Z-
dc.date.issued2019-
dc.identifier.urihttp://epub.vgu.edu.vn/handle/dlibvgu/101-
dc.description.abstractWe report a robust and high-yield fabrication method for wafer-scale patterning of high-quality arrays of dense gold nanogaps, combining displacement Talbot lithography based shrink-etching with dry etching, wet etching, and thin film deposition techniques. By using the self-sharpening of <111>-oriented silicon crystal planes during the wet etching process, silicon structures with extremely smooth nanogaps are obtained. Subsequent conformal deposition of a silicon nitride layer and a gold layer results in dense arrays of narrow gold nanogaps. Using this method, we successfully fabricate high-quality Au nanogaps down to 10 nm over full wafer areas. Moreover, the gap spacing can be tuned by changing the thickness of deposited Au layers. Since the roughness of the template is minimized by the crystallographic etching of silicon, the roughness of the gold nanogaps depends almost exclusively on the roughness of the sputtered gold layers. Additionally, our fabricated Au nanogaps show a significant enhancement of surface-enhanced Raman scattering (SERS) signals of benzenethiol molecules chemisorbed on the structure surface, at an average enhancement factor up to 1.5 × 106.12152-12160en_US
dc.language.isoenen_US
dc.publisherRoyal Society of Chemistryen_US
dc.relation.ispartofseriesNanoscale;Vol 11(25)-
dc.subjectWafer-scale fabricationen_US
dc.subjectHigh-quality tunableen_US
dc.subjectGold nanogap arraysen_US
dc.subjectSurface-enhanceden_US
dc.subjectRaman scatteringen_US
dc.titleWafer-scale fabrication of high-quality tunable gold nanogap arrays for surface-enhanced Raman scatteringen_US
dc.typeArticleen_US
dc.identifier.doi10.1039/c9nr02215e-
dc.relation.journaltypeSCI Q1en_US
item.languageiso639-1other-
item.grantfulltextopen-
item.fulltextWith Fulltext-
crisitem.author.orcid0000-0001-5632-6307-
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